| 三氧化钨薄膜材料制备的现状及研究趋势 |
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| 引用本文： | 唐一科,徐艳,许静,韦立凡.三氧化钨薄膜材料制备的现状及研究趋势[J].重庆科技学院学报(自然科学版),2005,7(1):1-4. |
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| 作者姓名： | 唐一科 徐艳 许静 韦立凡 |
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| 作者单位： | 重庆大学机械传动国家重点实验室,重庆,400044;中国工程物理研究院结构力学研究所,绵阳,621000 |
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| 摘 要： | 概述了三氧化钨薄膜材料的研究意义,并结合国内外文献综述了三氧化钨薄膜材料的各种制备方法及其性能的研究现状与进展,其中详细介绍了蒸发法、溅射法、溶胶凝胶法及其掺杂稀有金属研究等.目前大多数方法都能制备出均匀致密的三氧化钨薄膜,而且都具有良好的电致变色、光致变色、气致变色特性,同时在掺杂不同的稀有金属后可以用作不同气体的敏感材料.最后分析了三氧化钨薄膜材料制备和应用的发展趋势.
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| 关 键 词： | 三氧化钨 薄膜材料 制备方法 掺杂 |
| 文章编号： | 1673-1980(2005)01-0001-04 |
| 修稿时间： | 2005年4月2日 |
Current Status and Developmental Trend of Preparation of WO3 Thin - film |
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| TANG Yi-ke,XU Yan,XU Jing,WEI Li-fan.Current Status and Developmental Trend of Preparation of WO3 Thin - film[J].Journal of Chongqing University of Science and Technology:Natural Science Edition,2005,7(1):1-4. |
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| Authors: | TANG Yi-ke XU Yan XU Jing WEI Li-fan |
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| Abstract: | In this paper, the significance on studying WO_3 thin-film is presented briefly. Referring many domestic and overseas dissertation,current status and developmental trend of preparation of WO_3 thin-film are summarized. In addition, research status of doping noble mental and three preparative techniques including evaporation, sputtering and sol-gel are presented in details. At present, WO_3 films prepared by these techniques are even and compact. Because of its good electrochromic, photochromic and gasochromic properties, WO_3 films by doping different noble metals can be used as sensitive materials for different gases. Finally developmental trend of preparation and application of WO_3 thin-film is analyzed. |
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| Keywords: | tungsten trioxide thin-film material preparative technique doping |
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