| 感应同步器蚀刻技术的研究 |
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| 引用本文： | 熊祥玉.感应同步器蚀刻技术的研究[J].仪表技术与传感器,1997(2):18-20. |
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| 作者姓名： | 熊祥玉 |
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| 作者单位： | 中国舰船研究院武汉数字工程研究所 |
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| 摘 要： | 本文介绍的Ｈ２ＳＯ４／Ｈ２Ｏ２（硫酸／过氧化氢）蚀刻体系对于制造高精度直线式或旋转式感应同步器尤具实用价值
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| 关 键 词： | 感应同步器 蚀刻液 蚀刻体系 |
An Etching Technique for Inductosyns |
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| Xiong Xiangyu Wuhan Digital Engineering Institute,Wuhan ..An Etching Technique for Inductosyns[J].Instrument Technique and Sensor,1997(2):18-20. |
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| Authors: | Xiong Xiangyu Wuhan Digital Engineering Institute Wuhan |
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| Affiliation: | Xiong Xiangyu Wuhan Digital Engineering Institute,Wuhan 430074. |
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| Abstract: | The etching process is very important for an inductosyn and hence a digital apparatus. This paper shows that H 2SO 4/H 2O 2 etching system is of practical value for the manufacturing of high accuracy linear or rotary inductosyns. |
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| Keywords: | Inductosyn Etching Reagent Etching System |
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