| 极紫外/软X射线多层膜衍射光栅 |
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| 引用本文： | 金春水,张立超.极紫外/软X射线多层膜衍射光栅[J].光电工程,2007,34(5):27-32,102. |
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| 作者姓名： | 金春水 张立超 |
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| 作者单位： | 中国科学院长春光学精密机械与物理研究所,应用光学国家重点实验室,吉林,长春,130033;中国科学院长春光学精密机械与物理研究所,应用光学国家重点实验室,吉林,长春,130033;中国科学院研究生院,北京,100039 |
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| 基金项目： | 中国科学院知识创新工程项目
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国家重点实验室基金 |
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| 摘 要： | 多层膜光栅是集多层膜的高反射率与光栅的高光谱分辨于一身的新型光学元件,它的出现使得在极紫外/软X射线(EUV/SXR)波段采用非掠入射、高光谱分辨率的分光元件成为可能.对多层膜光栅的衍射特性进行了分析,这些衍射特性使多层膜光栅能够作为核心部件,实现很多新颖的EUV/SXR光谱仪器,如窄带X-UV单色仪与多色仪.近年来,多层膜光栅的制备领域不断地出现新的思想与方法,同时多层膜光栅的实际应用也不断增多.多层膜光栅作为一种重要的光学元件,在天文学、物理学和材料科学等领域具有广泛的用途.介绍了多层膜光栅在众多研究领域中的应用.
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| 关 键 词： | 极紫外 多层膜 衍射光栅 |
| 文章编号： | 1003-501X（2007）05-0027-06 |
| 收稿时间： | 2006/6/20 |
| 修稿时间： | 2006-06-202007-01-05 |
EUV/SXR multilayer diffractive grating |
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| JIN Chun-shui,ZHANG Li-chao.EUV/SXR multilayer diffractive grating[J].Opto-Electronic Engineering,2007,34(5):27-32,102. |
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| Authors: | JIN Chun-shui ZHANG Li-chao |
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| Affiliation: | 1, State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, the Chinese Academy of Sciences, Changchun 130033, China; 2, Graduate School of the Chinese Academy of Science, Beijing 100039, China |
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| Abstract: | Multilayer grating is a potent optical element in Extreme Ultraviolet (EUV) and Soft X-ray (SXR) region. By combining high reflectivity of multilayer and high spectral resolving ability of grating structure, multilayer grating enable the use of non-grazing incidence and high resolving power applications in EUV/SXR region. Dispersive characteristics of multilayer gratings are analyzed. By virtue of these characteristics, multilayer grating is a powerful optical element which is used in a wide region of astronomy, physics, material science, etc. In recent years, fabricating technologies of multilayer grating has been promoted greatly. Performance of multilayer grating is improved. Owing to this, application field of multilayer grating is largely extended. |
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| Keywords: | EUV Multilayer Diffractive gratings |
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