不同工艺条件下Ni／Ti周期性多层膜界面粗糙度的研究

本文采用直流磁控溅射法制备了一系列Ni／Ti周期性多层膜，用X射线小角衍射进行周期结构分析。主要研究了不同的制备工艺条件下，Ni／Ti周期性多层膜周期厚度和界面粗糙度的变化规律，从而归纳出最佳的溅射工艺条件。研究发现采用移动模式制备出的多层膜，其周期厚度的均匀性以及界面粗糙度均优于固定模式；并且在移动模式下制备的多层膜其界面粗糙度，随基片架移动速率的增大而减小。

Research of Interfacial Roughness of Ni/Ti Periodic Multilayer in Different Technology Conditions

In this paper, we use small-angle X-ray diffraction to analyze the periodical structures of a series of Ni/Ti multilayer fabricated by the DC magnetron sputtering. The main idea of this paper is to study the variations of periodical thickness and interracial roughness of the sample multilayer under different technology conditions and further obtain a optimum sputte- ring condition. It is found that both of the evenness of periodical thickness and interracial roughness of the multilayer fabricated by sweeping mode are better than the ones obtained by the stationary mode; moreover, under the sweeping mode, the interracial roughness will decrease as the speed of substrate increasing.