| 脉冲偏压对电弧离子镀TiCN薄膜组织结构的影响 |
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| 引用本文： | 刘恋,石倩,代明江,匡同春,林松盛,郭朝乾,李洪,苏一凡.脉冲偏压对电弧离子镀TiCN薄膜组织结构的影响[J].表面技术,2018,47(9):199-205. |
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| 作者姓名： | 刘恋 石倩 代明江 匡同春 林松盛 郭朝乾 李洪 苏一凡 |
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| 作者单位： | 华南理工大学材料科学与工程学院,广州510641;广东省新材料研究所,广州510650;现代材料表面工程技术国家工程实验室,广州510650;广东省现代表面工程技术重点实验室,广州510650;广东省新材料研究所,广州510650;现代材料表面工程技术国家工程实验室,广州510650;广东省现代表面工程技术重点实验室,广州510650;华南理工大学材料科学与工程学院,广州,510641 |
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| 基金项目： | 中山市广东省科学院技术转移专项（2016G1FC0006）；广东省科学院平台建设项目（2016GDASPT-0206）；广东省科学院科技创新发展专项（2017GDASCX-0202） |
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| 摘 要： | 目的改善TiCN薄膜的组织结构,进一步提高其硬度与结合力。方法采用电弧离子镀技术,通过改变脉冲偏压的幅值,制备一系列的TiCN薄膜。通过扫描电子显微镜(SEM)观察薄膜的表面和截面形貌,采用X射线衍射(XRD)对薄膜进行物相分析,用X射线光电子谱(XPS)表征元素的化学状态,通过能谱仪(EDS)分析薄膜的成分。采用显微维氏硬度计测量薄膜硬度,使用3D轮廓仪测量薄膜厚度,利用多功能材料表面性能试验仪进行划痕测试。结果偏压对薄膜的硬度、结合力、组织结构和沉积速度都有影响。随着脉冲偏压的提高,TiCN薄膜晶粒逐渐细化,沉积速率、结合力有先增大后减小的趋势,TiCN薄膜的硬度保持线性提高。偏压为-200 V时,TiCN薄膜出现C_3N_4新相,此时薄膜的硬度和结合力都大幅度提高,表面形貌发生突变,液滴最多。偏压为-250 V时,TiCN薄膜综合性能最好,并且表面的液滴明显减少,此时硬度值为4017HV,结合力为51 N。结论偏压对组织结构及碳元素在薄膜中的存在形式有一定影响,适当地改变脉冲偏压可以使TiCN薄膜的显微组织更加致密,同时,形成的弥散硬化相使薄膜具备较高的硬度和膜基结合强度。
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| 关 键 词： | TiCN薄膜 电弧离子镀 脉冲偏压 C3N4 硬度 结合强度 |
| 收稿时间： | 2018/6/15 0:00:00 |
| 修稿时间： | 2018/9/20 0:00:00 |
Effects of Pulsed Bias on Microstructure of TiCN Films by Arc Ion Plating |
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| LIU Lian,SHI Qian,DAI Ming-jiang,KUANG Tong-chun,LIN Song-sheng,GUO Chao-qian,LI Hong and SU Yi-fan.Effects of Pulsed Bias on Microstructure of TiCN Films by Arc Ion Plating[J].Surface Technology,2018,47(9):199-205. |
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| Authors: | LIU Lian SHI Qian DAI Ming-jiang KUANG Tong-chun LIN Song-sheng GUO Chao-qian LI Hong and SU Yi-fan |
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| Affiliation: | 1.School of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China; 2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China,2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China,2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China,1.School of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China,2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China,2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China,2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China and 2.Guangdong Institute of New Materials, Guangzhou 510650, China; 3.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Guangzhou 510650, China; 4.Key Lab of Guangdong for Modern Surface Engineering Technology, Guangzhou 510650, China |
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| Abstract: | |
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| Keywords: | TiCN films arc ion plating pulsed bias C3N4 hardness adhesion strength |
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