声表面波器件光刻的衍射效应研究

声表面波(SAW)器件光刻过程中，制作的光刻胶线条宽度与掩模版不一致，特别是不同宽度的非均匀线条光刻后线宽变化值存在偏差。该文研究了接近式曝光衍射效应对线宽的影响，分析了掩模版上线条和缝隙宽度、衍射光强、掩模版与光刻胶间距等参数间的关系。结果表明，通过建立光学模型给出了计算曝光后不同线条宽度变化值的方法，采用程序编程可对掩模版数据中不同尺寸的线条和缝隙宽度进行补偿，实现SAW器件非均匀线条宽度的精确控制。

Study on Diffraction Effects of Photolithography in SAW Devices

In the process of surface acoustic wave(SAW) device photolithography, the line width of the photoresist is inconsistent with the photomask, especially, the line width variation of the non-uniform lines with different widths has a deviation after photolithography. The influence of proximity exposure diffraction effect on the line width is studied in this paper. The relationships among the parameters such as line and gap widths on the photomask, diffracted light intensity, spacing between photomask and photoresist, etc are analyzed. The results show that the precise control of the non-uniform line width of SAW devices can be realized by using the method of calculating the variation value of different line widths after exposure by establishing an optical model, and by using the programming method to compensate the lines with different sizes and the gap widths in the photomask data file.