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Electrolyte composition and removal mechanism of Cu electrochemical mechanical polishing |
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| Affiliation: | [1]School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China; [2]School of Civil Engineering, Harbin Institute of Technology, Harbin 150001, China |
| Abstract: | electrochemical mechanical polishing electrolyte composition removal mechanism 5-methyl-lH-benzotriazole hydroxyethylidenediphosphoric acid tribasic ammonium citrate |
| Keywords: | electrochemical mechanical polishing electrolyte composition removal mechanism 5-methyl-lH-benzotriazole hydroxyethylidenediphosphoric acid tribasic ammonium citrate |
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