| 多晶硅太阳电池的等离子体预处理研究 |
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| 引用本文： | 黄岳文,季凯春,李华维,孙励斌,徐晓群,陈斌.多晶硅太阳电池的等离子体预处理研究[J].太阳能学报,2008,29(11). |
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| 作者姓名： | 黄岳文 季凯春 李华维 孙励斌 徐晓群 陈斌 |
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| 作者单位： | 宁波杉杉尤利卡太阳能科技发展有限公司,宁波,315177 |
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| 摘 要： | 采用H2、NH3和H2 NH3等离子体在沉积氮化硅薄膜之前对多晶硅片进行预处理,采用等离子增强化学气相沉积(PECVD)制备氮化硅薄膜,然后印刷烧结.利用准稳态光电导衰减法(QSSPCD)、傅里叶红外光谱仪(FT-IR)和紫外可见近红外分光光度计(UV-VIS)等手段研究了等离子体预处理对多晶硅少子寿命的影响以及等离子体预处理对氮化硅薄膜FTIR光谱的影响和多晶电池性能的影响.结果表明:经等离子体预处理后多晶硅的少子寿命有所提高,使用H2 NH3混合等离子体预处理后,制备的多晶电池的性能有明显提高,短路电流能提高约7%.
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| 关 键 词： | 多晶硅电池 等离子体预处理 氮化硅薄膜 |
PLASMA PREPROCESS OF MC-Si SOLAR CELLS |
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| Huang Yuewen,Ji Kaichun,Li Huawei,Sun Libin,Xu Xiaoqun,Chen Bin.PLASMA PREPROCESS OF MC-Si SOLAR CELLS[J].Acta Energiae Solaris Sinica,2008,29(11). |
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| Authors: | Huang Yuewen Ji Kaichun Li Huawei Sun Libin Xu Xiaoqun Chen Bin |
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| Affiliation: | Huang Yuewen Ji Kaichun Li Huawei Sun Libin Xu Xiaoqun Chen Bin (Ningbo Sbanshan Ulica Solar Science & Technology Co,Ltd,Ningbo 315177,China) |
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| Abstract: | The influence of different plasma(H_2 ,NH_3 ,H_2 + NH3)preprocessing of MC-Si solar cells before deposition of SiN_x thin fihns was described,which deposited by plasma enhanced chemical vapor deposition(PECVD).Then,MC-Si solar cells go through the process of printing as well as sintering.It also presented the plasma preprocessing impacts of li- fetime of MC-Si,of FFIR spectra of SiNx thin film and of MC-Si solar cells performance,while respectively employing quasi-steady-state photoconductance decay(QSSPCD)... |
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| Keywords: | muhi-crystalline silicon cells plasma preprocessing SiN_x thin film |
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