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单靶磁控溅射制备铜铟硒和铜铟锌硒薄膜及其结构、光学性质研究
引用本文:王伟君,何俊,张克智,陶加华,孙琳,陈晔,杨平雄,褚君浩. 单靶磁控溅射制备铜铟硒和铜铟锌硒薄膜及其结构、光学性质研究[J]. 无机材料学报, 2014, 29(11): 1223-1227. DOI: 10.15541/jim20140309
作者姓名:王伟君  何俊  张克智  陶加华  孙琳  陈晔  杨平雄  褚君浩
作者单位:(华东师范大学 电子工程系, 极化材料与器件教育部重点实验室, 上海 200241)
摘    要:采用单靶磁控溅射法制备了铜铟硒(CIS)和铜铟锌硒(CIZS)薄膜。XRD表征发现CIZS-300出现了与其它薄膜不同的择优取向, 分析认为贫铜的状态和适宜温度可能促使薄膜择优取向从(112)向(220)转化; 拉曼光谱在171 cm-1处出现的较强峰, 和206 cm-1处出现的较弱峰, 分别为A1和B2振动模式, 而Zn的掺入导致A1拉曼峰的宽化和蓝移; Zn的掺入使Cu含量改变进而使CIZS禁带宽度增大, 这是由于Se的p轨道和Cu的d轨道杂化引起的; SEM测试结果表明CIZS薄膜表面比CIS表面更为紧密、平滑。

关 键 词:磁控溅射  铜铟锌硒  锌掺杂  
收稿时间:2014-06-16

Structure and Optical Properties of CuInSe2 and Cu0.9In0.9Zn0.2Se2 Thin Films Deposited by One-step Radio-frequency Magnetron Sputtering
WANG Wei-Jun,HE Jun,ZHANG Ke-Zhi,TAO Jia-Hua,SUN Lin,CHEN Ye,YANG Ping-Xiong,CHU Jun-Hao. Structure and Optical Properties of CuInSe2 and Cu0.9In0.9Zn0.2Se2 Thin Films Deposited by One-step Radio-frequency Magnetron Sputtering[J]. Journal of Inorganic Materials, 2014, 29(11): 1223-1227. DOI: 10.15541/jim20140309
Authors:WANG Wei-Jun  HE Jun  ZHANG Ke-Zhi  TAO Jia-Hua  SUN Lin  CHEN Ye  YANG Ping-Xiong  CHU Jun-Hao
Affiliation:(Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai 200241, China)
Abstract:CuInSe2 (CIS) and Cu0.9In0.9Zn0.2Se2 (CIZS) thin films were deposited by Radio-Frequency (RF) magnetron sputtering process. X-ray diffraction (XRD) results indicate CIZS film deposited at 300℃ (CIZS-300) is (220) preferred orientation which is different from (112) preferred orientation of other films. Cu-poor and appropriate temperature are major factors for (220) preferred orientation of grains. The Raman spectra show a strong peak around 171 cm-1 and a weak peak around 206 cm-1, which corresponding to A1 and B2 modes. Substitution of Zn for Cu leads to a broadening and blue-shift of A1 Raman mode. The band gap Eopt of CIZS film increases due to a reduced Se p-Cu d interband repulsion with Zn doping. Scanning electron microscope (SEM) measurement demonstrates that the surface morphology of CIZS is more compact and smoother than that of CIS thin films.
Keywords:magnetron sputtering  CIZS thin film  Zn doping  
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