| 适用于沉积工艺的真空技术 |
| |
| 作者姓名： | KirelTang WANGYing-pei MikeCzerniak |
| |
| 作者单位： | [1]BOCEdwards,LoyangIndustrialEstate,Singapore [2]BOCEdwards,Pudong,Shanghai200131China [3]BOCEdwards,WestSussex,EnglandRH102LW |
| |
| 摘 要： | 半导体生产中的薄膜沉积工艺通常对真空泵的要求很严格。在该工艺中高故障率和停机现象较为普遍。iH真空泵是特别为应付恶劣的薄膜工艺环境所设计。阐述了iH系列干泵在LPCVD氮化硅工艺应用中的成功表现。
|
| 关 键 词： | 沉积 工艺 真空技术 干泵 |
| 文章编号： | 1004-4507(2004_04-0015-03 |
| 修稿时间： | 2004年3月23日 |
Harsh Pumping for Deposition Process Made Easy |
| |
| KirelTang WANGYing-pei MikeCzerniak.Harsh Pumping for Deposition Process Made Easy[J].Equipment for Electronic Products Marufacturing,2004,33(4):15-17. |
| |
| Authors: | Kirel Tang WANG Ying-pei Mike Czerniak |
| |
| Abstract: | Harsh thin film deposition processes in semiconductor wafer fabs are often the most challenging applications for vacuum drypumps, where high failures and stoppages can be the norm. The iH pump is specially designed to cope with the harsh environment of thin film deposition process. This study reports specifically on the trial and successful results of the iH series drypump on a LPCVD nitride process. |
| |
| Keywords: | Deposition: Process: Harsh pumping: Dry pump |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
