Fabrication and characterization of in-situ duplex plasma-treated nanocrystalline Ti/AlTiN coatings |
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| Affiliation: | 1. School of Materials Science and Engineering, Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, PR China;2. Micro Materials Ltd, Yale Business Village, Ellice Way, Wrexham LL13 7YL, United Kingdom;1. Christian Doppler Laboratory for Application Oriented Coating Development at the Institute of Materials Science and Technology, Vienna University of Technology, Vienna, Austria;2. Christian Doppler Laboratory for Application Oriented Coating Development at the Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria;3. Oerlikon Balzers Coating AG, Balzers, Liechtenstein;4. Plansee Composite Materials GmbH, Lechbruck am See, Germany;5. Institute of Materials Science and Technology, Vienna University of Technology, Vienna, Austria;1. Department of Materials Physics, Montanuniversität Leoben and Erich Schmid Institute for Materials Science, Austrian Academy of Sciences, Austria;2. Materials Center Leoben Forschung GmbH, Leoben, Austria;3. Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria;4. Institute of Physics, Slovak Academy of Sciences, Bratislava, Slovakia;5. Böhlerit GmbH & Co KG, 8605 Kapfenberg, Austria;1. Key Laboratory of Advanced Technologies of Materials, Ministry of Education, Southwest Jiaotong University, Sichuan, Chengdu 610031, China;2. National Key Laboratory for Surface Physics and Chemistry, Mianyang 621907, China |
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| Abstract: | Plasma nitriding and plasma-assisted PVD duplex treatment was adopted to improve the load-bearing capacity, fatigue resistance and adhesion of the AlTiN coating. Ion etch-cleaning was applied for better adhesion before plasma nitriding. After plasma nitriding Ti interlayer was in-situ deposited by high power impulse magnetron sputtering (HIPIMS), followed by the AlTiN coating through in-situ deposition by advanced plasma-assisted arc (APA-Arc). The microstructure and properties of the duplex-treated coating were carefully characterized and analyzed. The results show that the thicknesses of the nitriding zone, the γ′-Fe4N compound layer, the Ti interlayer and the AlTiN top layer with nanocrystalline microstructures are about 60 μm, 2–3 μm, 100 nm and 6.1 μm, respectively. The nitriding rate is about 30 μm/h and the AlTiN coating deposition rate reaches 6.1 μm/h. The interfacial adhesion of the Ti/AlTiN coating is well enhanced by ion etch-cleaning and a Ti interlayer, and the load-bearing capacity is also improved by duplex treatment. In addition, the instinct hardness of the Ti/AlTiN coating reaches 3368HV0.05 while the wear rate coefficient of 5.394×10−8 mm−3/Nm is sufficiently low. The Ti/AlTiN coating, which possesses a high corrosion potential (Ecorr=−104.6 mV) and a low corrosion current density (icorr=4.769 μA/cm2), shows highly protective efficiency to the substrate. |
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| Keywords: | Plasma nitriding Duplex treatment HIPIMS AlTiN Ti interlayer Arc |
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