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UHF频段高功率SiC SIT
引用本文:陈刚,王雯,柏松,李哲洋,吴鹏,李宇柱,倪炜江.UHF频段高功率SiC SIT[J].固体电子学研究与进展,2011,31(1):20-23.
作者姓名:陈刚  王雯  柏松  李哲洋  吴鹏  李宇柱  倪炜江
作者单位:单片集成电路与模块国家重点实验室,南京电子器件研究所,南京,210016
摘    要:采用导通SiC衬底上的SiC多层外延材料,成功制作出了国内首个SiC SIT(静电感应晶体管).该器件研制中,采用了自对准工艺、高能离子注入及高温退火工艺、密集栅深凹槽干法刻蚀工艺、PECVD SiO:和SizNy介质钝化工艺,有效抑制了漏电并提高了器件击穿电压,器件功率输出能力由此得到提升.最终28 cm栅宽SiC ...

关 键 词:宽禁带半导体  碳化硅  静电感应晶体管  离子注入

High Output Power SiC SIT for UHF Band Microwave Application
CHEN Gang,WANG Wen,BAI Song,LI Zheyang,WU Peng,LI Yuzhu,NI Weijiang.High Output Power SiC SIT for UHF Band Microwave Application[J].Research & Progress of Solid State Electronics,2011,31(1):20-23.
Authors:CHEN Gang  WANG Wen  BAI Song  LI Zheyang  WU Peng  LI Yuzhu  NI Weijiang
Abstract:SiC SIT devices with 550 W output power have been fabricated on SiC epitaxial wafer for UHF band applications.The developed devices adopted a p-type Al ion implanted gate with a recessed structure and their power performance was improved by decreased leakage current and enhanced break-down voltage.The self-aligned,dense gate recess etching,high temperature anneals and PECVD passivation process technologies were adopted.At 500 MHz and 90 V drain to source voltage,a 28 cm gate periphery SiC SIT exhibited output power of 550 W with gain of 11.3 dB under pulsed RF operation.
Keywords:wide band-gap semiconductor  SiC  SIT  ion implant
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