近场纳米光纤探针腐蚀制备技术概述

纳米光纤探针是扫描近场光学显微镜的常用关键器件，化学腐蚀法制备近场光学光纤探针是基于腐蚀液弯液面的高度随光纤芯径的动态变化过程。从流体力学杨一拉普拉斯方程出发，研究了弯液面高度随光纤芯径大小的变化关系，分析了影响腐蚀法制备纳米光纤探针的相关因素，追踪了利用化学腐蚀制备纳米光纤探针的最新进展，介绍了静态腐蚀法、动态腐蚀法和选择腐蚀法等多种方法，并分析了每种方法的特点，作了比较和总结。

Review on chemical etching techniques for preparation of near field nanometric optical fiber probes

Optical fiber nano-probe is usually the key component of the near-field optical microscope. The principle of fabrication of near-field optical fiber probe by chemical etching is based on the dynamic characteristics of etching meniscus associated with alteration of the fiber diameter. According to derivation from Young-Laplace equation of hydromechanics, the relationship between the height of meniscus and fiber diameter was described. Other related parameters that influencing the etching result of optical fiber nano-probes were discussed. Various etching methods, such as static chemical etching, dynamic chemical etching and selective chemical etching were described respectively. Furthermore, the characteristics of each method were analyzed and compared.