| 非对称双极脉冲磁控溅射沉积氮化铬铝涂层的微观结构和硬度 |
| |
| 引用本文： | 李明升,范永中,张淑娟,祝文,段为梁. 非对称双极脉冲磁控溅射沉积氮化铬铝涂层的微观结构和硬度[J]. 稀有金属材料与工程, 2010, 39(Z1) |
| |
| 作者姓名： | 李明升 范永中 张淑娟 祝文 段为梁 |
| |
| 作者单位： | 江西科技师范学院,江西,南昌,330013 |
| |
| 基金项目： | 江西省自然科学基金，江西省教育厅科技项目 |
| |
| 摘 要： | 利用非对称双极脉冲磁控溅射技术,双极分别接纯铬靶和纯铝靶,通过调整两靶的功率,以反应溅射的方式沉积不同铬铝比的氮化铬铝涂层。研究不同Al含量的氮化铬铝涂层的结构和硬度。所获得的涂层依次为Cr0.95Al0.05N、Cr0.9Al0.1N、Cr0.83Al0.17N和Cr0.75Al0.25N,均为B1NaCl结构,(220)为主要的织构取向。随着涂层中Al含量的增加,涂层表面突起的尺寸逐渐降低,涂层趋于光滑致密;低Al含量涂层为柱状晶结构,随Al含量提高,涂层结构更加致密,并向等轴晶结构转变。涂层硬度随Al含量的提高先增加后降低,Cr0.83Al0.17N涂层表现出最高的硬度,维氏硬度达到33GPa以上。
|
| 关 键 词： | 非对称双极脉冲磁控溅射 氮化铬铝涂层 微观结构 硬度 |
Microstructure and Hardness of Chromium Aluminum Nitride Coatings Deposited by Asymmetrical Bipolar Magnetron Sputtering |
| |
| Li Mingsheng,Fan Yongzhong,Zhang Shujuan,Zhu Wen,Duan Weiliang. Microstructure and Hardness of Chromium Aluminum Nitride Coatings Deposited by Asymmetrical Bipolar Magnetron Sputtering[J]. Rare Metal Materials and Engineering, 2010, 39(Z1) |
| |
| Authors: | Li Mingsheng Fan Yongzhong Zhang Shujuan Zhu Wen Duan Weiliang |
| |
| Affiliation: | Li Mingsheng,Fan Yongzhong,Zhang Shujuan,Zhu Wen,Duan Weiliang (Jiangxi Normal University of Science , Technology,Nanchang 330013,China) |
| |
| Abstract: | Chromium aluminum nitride coatings with different Al content were deposited using an asymmetrical bipolar magnetron sputtering method by adjusting the power of Cr target and Al target.Cr0.95Al0.05N,Cr0.9Al0.1N,Cr0.83Al0.17N and Cr0.75Al0.25N coatings were obtained and all of them exhibited the B1NaCl phase with preferred orientation of (220).The introduction of Al into the coating decreased the roughness and improved the density of the coatings and gave rise of the change of coating structure from columnar ... |
| |
| Keywords: | asymmetrical bipolar magnetron sputtering chromium aluminum nitride coatings structure hardness |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
