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Novel plating solution for electroless deposition of gold film onto glass surface
Authors:Jiandong Hu  Wei Li  Xiangyang Zhao
Affiliation:a College of Mechanical and Electrical Engineering, Henan Agricultural University, 95 Wenhua Road, Zhengzhou, 450002, PR China
b School of Science, Henan Agricultural University, Zhengzhou 450002, China
c Henan Nongda Xunjie Measurement Technology Co. Ltd. Zhengzhou, 450002, China
Abstract:In this paper, a simple and environmentally friendly electroless plating solution of chloroauric acid (HAuCl4) and hydrogen peroxide (H2O2) for depositing gold film onto (3-aminopropyl)-trimethoxysilane (APTMS) -coated glass surface has been developed. APTMS as an adhesive reagent was used to attach the gold nanoparticles (AuNPs) onto the glass substrate. These AuNPs could be regarded as the preferential nucleation or catalytic sites for gold electroless reduction, which accelerated the reduction of Au3+ on the glass surface and effectively prevented the formation of gold metal in the bulk solution. During the gold plating process, H2O2 as the reducing agent was thermodynamically capable of reducing Au3+ ions from the HAuCl4 precursor to gold atoms, which deposited onto the glass surface and finally formed the continuous gold film. The resulting gold film was characterized with X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM) and atomic force microscope (AFM), respectively.
Keywords:79.60.Bm Clean metal, semiconductor, and insulator surfaces   81.05.Kf Glasses,including metallic glasses.   79.60.Dp Adsorbed layers and thin films   61.46.+w Nanoscale materials: clusters,nanoparticles, nanotubes, and nanocrystals 81.15.Lm Liquid phase epitaxy   deposition from liquid phases   81.07.b Nanoscale materials and structures: fabrication and characterization   61.10.Nz X-ray diffraction   68.55.Jk Structure and morphology   thickness   crystalline orientation and texture   68.37.Ps Atomic force microscopy (AFM)   68.35.Ct Interface structure and roughness   33.60.Fy X-ray photoelectron spectra
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