The effect of oxygen concentration on the low temperature deposition of TiO2 thin films |
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| Authors: | H Toku HS Maciel UA Mengui |
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| Affiliation: | a Instituto Tecnológico de Aeronáutica, Laboratório de Plasmas e Processos, 12228-900, S.J. Campos, SP, Brazil
b Instituto Nacional de Pesquisas Espaciais, Laboratório Associado de Sensores e Materiais, 12227-010, S.J. Campos, SP, Brazil |
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| Abstract: | The aim of this study was to investigate the influence of oxygen concentration in Ar/O2 gas mixture on the crystalline properties of TiO2 thin films obtained at low temperature by reactive magnetron sputtering technique. Mass spectrometry of plasma medium provides, in conjunction with XRD and AFM measurements, a guide for attainment of good quality anatase TiO2 films. |
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| Keywords: | Thin films Titanium dioxide Sputtering Surface structure Morphology |
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