| 掩模投影成像干涉光刻研究 |
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| 引用本文： | 张锦,冯伯儒,刘娟.掩模投影成像干涉光刻研究[J].光电工程,2006,33(2):1-4. |
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| 作者姓名： | 张锦 冯伯儒 刘娟 |
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| 作者单位： | 1. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川,成都,610209
2. 中国科学院光电技术研究所微细加工光学技术国家重点实验室,四川,成都,610209;中国工程物理研究院电子工程研究所,中国,绵阳,621900 |
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| 摘 要： | 掩模投影成像干涉光刻技术以在很小或几乎不增加光刻系统成本的基础上来提高光刻分辨率为目的,充分利用系统的有限孔径,将掩模图形不同的空间频率分别进行传递,最终以高分辨率对掩模成像。本文阐述了IIL的基本原理,介绍了一种实验系统,并给出了部分模拟和实验结果。研究结果表明,掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
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| 关 键 词： | 投影光刻 成像干涉光刻 微光刻 |
| 文章编号： | 1003-501X(2006)02-0001-04 |
| 收稿时间： | 2005-11-08 |
| 修稿时间： | 2006-01-03 |
Study on imaging interferometric lithography |
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| ZHANG Jin,FENG Bo-ru,LIU Juan.Study on imaging interferometric lithography[J].Opto-Electronic Engineering,2006,33(2):1-4. |
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| Authors: | ZHANG Jin FENG Bo-ru LIU Juan |
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| Affiliation: | 1. State Key Laboratory of Optical Technologies for Microfabrication, the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China; 2. The Institute of Electronics Engineering, the Chinese Academy of Engineering Physics, Mianyang 621900, China |
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| Abstract: | Imaging Interferometric Lithography (IIL) transfers different components of spatial frequencies through the same limited aperture at different time to enhance the resolution power of lithography with increasing less cost of system. In this article, the principle of IIL is presented, a kind of experiment system is introduced and the modeling and experiment results are given. The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL). |
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| Keywords: | Projection lithography Imaging interferometric lithography Microlithography |
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