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Admittance spectroscopy of a phosphorus-doped n-diamond homoepitaxial layer
Authors:Yasuo Koide   S. Koizumi   H. Kanda   M. Suzuki   H. Yoshida   N. Sakuma   T. Ono  T. Sakai
Affiliation:aAdvanced Materials Laboratory, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;bCorporate Research and Development Center, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki, 212-8582, Japan
Abstract:Generation and recombination processes of electrons through phosphorus (P) donor are analyzed by admittance spectroscopy for a Ni/Au Schottky contact on an n-diamond epilayer. The dependence of capacitance and conductance frequency on temperature is interpreted by Shockley–Read–Hall statistics. The thermal ionization energy and capture cross-section of P donor are evaluated to be 0.54 ± 0.02 eV and (4.5 ± 2.0) × 10− 17 cm2, respectively. Broadening of the conductance–frequency curve is observed, which is believed to be evidence of a long Debye tail of electron distribution at the depletion layer edge.
Keywords:Diamond   Admittance spectroscopy   Phosphorus donor   Deep dopant   Debye tail   Depletion layer
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