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采用钛-铝-钼过渡层在铜基底上沉积金刚石薄膜的研究
引用本文:程春晓,姚宁,马丙现,杨仕娥,赵永梅,张兵临. 采用钛-铝-钼过渡层在铜基底上沉积金刚石薄膜的研究[J]. 真空与低温, 2005, 11(1): 46-49
作者姓名:程春晓  姚宁  马丙现  杨仕娥  赵永梅  张兵临
作者单位:郑州大学,材料物理教育部重点实验室,河南,郑州,450052
摘    要:采用钛-铝-钼过渡层研究了铜基片上金刚石薄膜的化学气相沉积.用SEM和Raman谱研究了薄膜的形貌和质量.用XRD分析了膜基间形成的化合物的成分,并进一步分析了铝的存在对膜基结合力的影响.实验证明,钛-铝-钼过渡层的存在显著提高了金刚石薄膜与铜基底的结合力.

关 键 词:金刚石薄膜  化学气相沉积  铜基底  过渡层
文章编号:1006-7086(2005)01-0046-04
修稿时间:2004-08-30

DIAMOND FILMS DEPOSITED ON COPPER SUBSTRATE WITH Ti-Al-Mo INTERMEDIATE LAYER
CHENG Chun-xiao,YAO Ning,MA Bing-xian,YANG Shi-e,ZHAO Yong-mei,ZHANG Bing-lin. DIAMOND FILMS DEPOSITED ON COPPER SUBSTRATE WITH Ti-Al-Mo INTERMEDIATE LAYER[J]. Vacuum and Cryogenics, 2005, 11(1): 46-49
Authors:CHENG Chun-xiao  YAO Ning  MA Bing-xian  YANG Shi-e  ZHAO Yong-mei  ZHANG Bing-lin
Abstract:The chemical vapor deposition of dia mond films on copper substrates with Ti -Al -Mo intermediate layer was studied.Scanning electron microsc opy and Raman spectroscopy were used to analyze the films.The component o f composites formed in the interface of the films a nd substrate was examined by XRD.The effect on the adhesion due to the exis tence of Al film was further studied.It showed t hat the adhesion of the diamond films on the copper substrate could be greatly improved.
Keywords:diamond films  chemical vapor deposition  copper substrate  intermedi ate layer
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