| sol-gel法制备多孔纳米SiO2薄膜 |
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| 引用本文： | 李智,姚熹,张良莹. sol-gel法制备多孔纳米SiO2薄膜[J]. 电子元件与材料, 2005, 24(2): 32-34,37 |
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| 作者姓名： | 李智 姚熹 张良莹 |
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| 作者单位： | 西安交通大学电子材料研究所,陕西,西安,710049;西安交通大学电子材料研究所,陕西,西安,710049;同济大学功能材料研究所,上海,200092;同济大学功能材料研究所,上海,200092 |
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| 基金项目： | 国家重点基础研究发展计划(973计划);上海市学科科研项目 |
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| 摘 要： | 以 NH_3·H_2O 为催化剂,用正硅酸乙酯(TEOS)溶胶–凝胶工艺制备纳米多孔二氧化硅薄膜。强碱催化使二氧化硅胶粒溶解度增大并增大了体系的离子强度;丙三醇的加入,与水解中间体结合,有效抑制了二氧化硅溶胶胶粒的长大;PVA(聚乙烯醇)对二氧化硅胶粒有强的吸附作用,使胶粒聚联成大的网络结构,增加了成膜性能。通过改变反应物的剂量,调节添加剂的用量,可以制得折射率 1.18~1.42,对应孔率 60.50%~7.75%并且孔径小于 100 nm 的纳米多孔二氧化硅薄膜,。单层薄膜厚度在 3 μm 以内精确可控。
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| 关 键 词： | 无机非金属材料 纳米多孔二氧化硅薄膜 溶胶—凝胶工艺 孔率 厚度控制 |
| 文章编号： | 1001-2028(2005)02-0032-03 |
Nano-porous Silica Films Prepared by sol-gel Granular Silica Sol |
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| LI Zhi,YAO Xi,,ZHANG Liang-ying. Nano-porous Silica Films Prepared by sol-gel Granular Silica Sol[J]. Electronic Components & Materials, 2005, 24(2): 32-34,37 |
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| Authors: | LI Zhi YAO Xi ZHANG Liang-ying |
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| Affiliation: | LI Zhi1,YAO Xi1,2,ZHANG Liang-ying2 |
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| Abstract: | Homogeneous nanoporous silica films were prepared with colloidal silica sol derived by sol-gel technique of tetraethylorthosilicate(TEOS) catalyzed with NH3?H2O. Dense ammonia enhanced the colloidal solubility of silica and ion intensity; glycerol effectively restrained the growth of silica particles; and PVA adhered to silica particles to form a network, which make it easy to prepare silica films. The pore sizes is < 100 nm, the porousity is between 60.50%~7.75%. The refractive indexes of the silica films is between 1.18~1.42 and one layer of the silica films can be adjusted within 3 μm thick. |
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| Keywords: | inorganic non-metallic materials nano-porous silica films sol-gel technique porousity: the adjustment of thick |
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