| 极紫外啁啾多层膜反射镜的拟合分析 |
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| 引用本文： | 陈锐,袁艳红,赵华. 极紫外啁啾多层膜反射镜的拟合分析[J]. 上海电机学院学报, 2009, 12(1) |
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| 作者姓名： | 陈锐 袁艳红 赵华 |
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| 作者单位： | 上海电机学院,应用数理研究所,上海,200240 |
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| 摘 要： | 设计并制备了极紫外啁啾多层膜反射镜,利用同步辐射反射率测试装置完成了样品反射率的测试,采用单纯形算法拟合了反射率测试曲线,分析了顶层Si的氧化对拟合结果的影响.拟合结果表明,2块样品的Si-on-Mo粗糙度为0.4 nm和0.5 nm,Mo-on-Si粗糙度为0.8 nm和0.9 nm,顶层Si的氧化是影响极紫外啁啾多层膜反射镜反射率的重要因素.
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| 关 键 词： | 薄膜光学 啁啾多层膜反射镜 单纯形算法 亚飞秒脉冲 |
The Fitting and Analysis of Chirped Multilayer Mirrors in the Extreme Ultraviolet Region |
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| CHEN Rui,YUAN Yanhong,ZHAO Hua. The Fitting and Analysis of Chirped Multilayer Mirrors in the Extreme Ultraviolet Region[J]. JOurnal of Shanghai Dianji University, 2009, 12(1) |
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| Authors: | CHEN Rui YUAN Yanhong ZHAO Hua |
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| Affiliation: | Institute of Applied Mathematics and Physics;Shanghai Dianji University;Shanghai 200240;China |
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| Abstract: | The chirped multilayer mirror in the extreme ultraviolet region is designed and fabricated in this paper.The reflectivity is measured using the synchrotron radiation.The measured reflectivity curves are fitted using the simplex algorithm.The oxidation of the Si layer at the vacuum boundary is analyzed. Results indicate that the roughness of Si-on-Mo is 0.4 nm and 0.5 nm,the roughness of Mo-on-Si is 0.8 nm and 0.9 nm,and the oxidation of the Si layer at the vacuum boundary should be a key factor affecting th... |
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| Keywords: | thin film optics chirped multilayer mirror simplex algorithm sub-femtosecond pulses |
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