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[001]织构和非织构CVD金刚石膜的电学特性
引用本文:王林军,夏义本,居建华. [001]织构和非织构CVD金刚石膜的电学特性[J]. 功能材料, 2000, 31(6): 608-609,611
作者姓名:王林军  夏义本  居建华
作者单位:上海大学材料科学与工程学院,上海
摘    要:研究了「001」织构和非织构金刚石膜的暗电流-电压特性、电流-温度特性以及在稳定X射线辐照下的响应。结果表明「001」织构的金刚石膜相对非织构多晶金刚石膜具有大的暗电流和X射线响应。主要由于非织构金刚石膜含有大量的晶粒间界,导致对载流子的传输产生强烈散射。在高于500K的温度区域内,随着温度的上升「001」织构和非强构的金刚石膜的电流都将以指数式上升,这与Si占据金刚石格点产生1.68eV的激活能有关。

关 键 词:CVD金刚石 电学特性 X射线探测器 金刚石膜 织构
文章编号:1001-9731(2000)06-0608-02

Electrical Properties of [001] Textured and Non-Texture d CVD Diamond Films
WANG Linjun,Xia Yiben,JU Jianhua,ZHANG Wenguang. Electrical Properties of [001] Textured and Non-Texture d CVD Diamond Films[J]. Journal of Functional Materials, 2000, 31(6): 608-609,611
Authors:WANG Linjun  Xia Yiben  JU Jianhua  ZHANG Wenguang
Abstract:In this paper,electrical properties of X-ra y detectors using [001] textured and non-textured CVD diamond films were characterized and investigated. Results indicated that dark current s and photocurrents by X-ray irradiation for the [001] textured CVD diamond film were greater than those for the non-textured one. The differences in dark currents and resistivities were attributed to a l arge number of grain boundaries contained in the non-textured diamond films. From the I-T curves, at the temperature higher than 500K, currents clearly followed an exponential behavior because of the activ ation energy of Ea=1.68eV which was normally attributed to Si tr apped to a vacancy in the diamond lattice.
Keywords:CVD diamond films  electrical properties  X-ray detecto rs  
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