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应力对非晶超磁致伸缩薄膜形变影响的理论计算
引用本文:刘吉延,斯永敏. 应力对非晶超磁致伸缩薄膜形变影响的理论计算[J]. 材料科学与工程学报, 2005, 23(2): 276-278
作者姓名:刘吉延  斯永敏
作者单位:国防科技大学航天与材料工程学院,湖南,长沙,410073;国防科技大学航天与材料工程学院,湖南,长沙,410073
摘    要:分析材料磁化过程中引起磁致伸缩的机理,考虑应力对磁化过程的影响,通过将应力作用等效为磁场,并假设非晶超磁致伸缩薄膜的低场磁化为可逆过程,根据能量最低原理,建立了磁致伸缩薄膜形变与应力之间的关系,给出了表达式.

关 键 词:超磁致伸缩  非晶薄膜  应力  等效磁场
文章编号:1004-793X(2005)02-0276-00
修稿时间:2003-11-30

Theoretical Calculation to Determine the Influence of the Stress on the Strain of the Giant Magnetostrictive Thin Films
LIU Ji-yan,SI Yong-min. Theoretical Calculation to Determine the Influence of the Stress on the Strain of the Giant Magnetostrictive Thin Films[J]. Journal of Materials Science and Engineering, 2005, 23(2): 276-278
Authors:LIU Ji-yan  SI Yong-min
Abstract:The mechanism of the magnetostriction during the magnetization process is analysed.By means of treating the stress as an effective field,and under the assumption of a reversible magnetization process of amorphous giant magnetostrictive thin films subjected to low magnetic fields, the theoretical calculation to determine the influence of stress on the strain of the thin films is made based on the principle of lowest energy.And the expression is presented.
Keywords:giant magnetostriction  amorphous thin film  stress  effective field
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