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直接感光法制备锆钛酸铅镧薄膜图形及其性能
引用本文:张卫华,石春梅,袁媛,赵高扬,盛淑月. 直接感光法制备锆钛酸铅镧薄膜图形及其性能[J]. 半导体学报, 2008, 29(6): 1189-1193
作者姓名:张卫华  石春梅  袁媛  赵高扬  盛淑月
作者单位:西安理工大学材料科学与工程学院,西安,710048;西安理工大学材料科学与工程学院,西安,710048;西安理工大学材料科学与工程学院,西安,710048;西安理工大学材料科学与工程学院,西安,710048;西安理工大学材料科学与工程学院,西安,710048
基金项目:陕西省自然科学基金 , 西安应用材料锄新基金 , 陕西省电工材料与溶(浸)渗技术重点实验室基金
摘    要:采用化学修饰溶胶凝胶工艺,以PVP为薄膜开裂抑制剂,以苯酰丙酮为化学修饰剂,利用其与金属盐形成的配位螫合物结构,合成了具有紫外光感应特性的锆钛酸铅镧(Pb0.91La0.09(Zr0.65Ti0.35)O3,PLZT)前驱溶胶;对单次提拉得到的凝胶薄膜进行直接感光法图形制备;通过后续热处理,在Pt/TiO2/SiO2/Si衬底上得到了具有钙钛矿结构的PLZT薄膜图形,其最终热处理后的膜厚约为260nm,剩余极化强度约为6.7μC/cm2,矫顽场强约为77kV/cm,相对介电常数约为356,介电损耗约为0.02,漏电流密度小于10-2μA/cm2,极化疲劳特性可达107以上.

关 键 词:锆钛酸铅镧薄膜  溶胶凝胶  微细图形  感光性

Pattern Fabrication on PLZT Films and Their Properties by a Direct Patterning Process
Zhang Weihu,Shi Chunmei,Yuan Yuan,Zhao Gaoyang and Sheng Shuyue. Pattern Fabrication on PLZT Films and Their Properties by a Direct Patterning Process[J]. Chinese Journal of Semiconductors, 2008, 29(6): 1189-1193
Authors:Zhang Weihu  Shi Chunmei  Yuan Yuan  Zhao Gaoyang  Sheng Shuyue
Affiliation:School of Materials Science & Engineering, Xi'an University of Technology, Xi'an 710048, China;School of Materials Science & Engineering, Xi'an University of Technology, Xi'an 710048, China;School of Materials Science & Engineering, Xi'an University of Technology, Xi'an 710048, China;School of Materials Science & Engineering, Xi'an University of Technology, Xi'an 710048, China;School of Materials Science & Engineering, Xi'an University of Technology, Xi'an 710048, China
Abstract:The photosensitive Pb0.91La0.09(Zr0.65Ti0.35)O3(PLZT)precursor sols are prepared by a modified sol-gel process with benzoylacetone as chemical modification to form a coordination chelate structure of metal-salt with PVP as an addition agent for suppressing film cracks.The patterns of PLZT gel films are prepared by direct patterning process and single dip-coating,and the PLZT film patterns with perovskite structure on Pt/TiO2/SiO2/Si substrate are obtained after heat-treatment.The PLZT film's pattern thickne...
Keywords:PLZT films  sol-gel  fine-patterning  photosensitivity
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