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Profiling Mobility Components near the Heterointerfaces of Thin Silicon Films
Authors:Zaitseva  E. G.  Naumova  O. V.  Fomin  B. I.
Affiliation:1.Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, Russia
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Abstract:Semiconductors - A method for profiling the components of effective carrier mobility μeff determined by scattering at surface phonons and the roughness of thin film/dielectric interfaces is...
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