An optimized process for fabrication of high-aspect-ratio photoresist-derived carbon microelectrode array on silicon substrate |
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Authors: | Zirong Tang Tielin Shi Lei Nie |
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Affiliation: | a Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China b State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China |
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Abstract: | An optimized process was developed for fabrication of high-aspect-ratio photoresist-derived carbon microelectrode array on silicon substrate. This process consisted of conventional photolithography, three-step linear pyrolyzing process and micromechanical interlocking. Comparing with previous two-step pyrolysis, three-step linear pyrolysis process can better preserve the geometry of microstructure during pyrolysis, and micromechanical interlocking was introduced to improve bonding strength between carbon microstructure and substrate. As a result, it can be achieved that high-aspect-ratio carbon microelectrode array remained upright and robustly with substrate. The experimental results confirmed that the optimized process is very effective, and the technology will be helpful for integration of 3-dimensional carbon-based devices in the fields of bioMEMS and electrochemical analysis. |
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Keywords: | Glassy carbon High-aspect-ratio Microelectrode array Pyrolysis Micromechanical interlocking |
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