Atomic layer deposited aluminum oxide barrier coatings for packaging materials |
| |
| Authors: | Terhi Hirvikorpi Mika Vähä-Nissi Tuomas Mustonen Eero Iiskola |
| |
| Affiliation: | a Oy Keskuslaboratorio - Centrallaboratorium Ab (KCL), P.O. Box 70, FI-02151 Espoo, Finland
b Laboratory of Inorganic Chemistry, Department of Chemistry, Helsinki University of Technology, P.O. Box 6100, FI-02015 TKK, Finland |
| |
| Abstract: | Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas. |
| |
| Keywords: | Atomic layer deposition Aluminum oxide Diffusion barriers Biodegradable polymers Polymers Packaging material |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
