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| 采用电化学法研究Fe-W-P合金化学沉积工艺 | |
| 引用本文： | 张建辉,黄桂芳,刘玉玲,邹明亮. 采用电化学法研究Fe-W-P合金化学沉积工艺[J]. 材料保护, 2009, 42(2) |
| 作者姓名： | 张建辉 黄桂芳 刘玉玲 邹明亮 |
| 作者单位： | 1. 湖南大学物理与微电子科学学院,湖南,长沙,410082;长沙环境保护职业技术学院,湖南,长沙,410004 2. 湖南大学物理与微电子科学学院,湖南,长沙,410082 3. 长沙环境保护职业技术学院,湖南,长沙,410004 |
| 摘 要： | 通过偶接金属铝,采用化学沉积方法制备Fe-W-P三元合金镀层,用电化学方法研究了镀液组成对Fe-W-P化学沉积行为的影响,并分析了偶接金属铝对合金沉积的诱导作用,对合金沉积的机理进行了初步探讨.结果表明,改变镀液组成和沉积工艺,沉积电位和沉积电流随之变化,增大镀液中NaOH和还原剂NaH2PO2·H2O的浓度,沉积电位负移,沉积速率增大,而随着钨酸钠的加入镀层的沉积速率稍有下降,表明钨酸钠对Fe-W-P的化学沉积有一定的抑制作用.偶接金属铝使体系的电位负移,降低了阴阳极极化电阻,诱导了Fe-W-P三元合金的共沉积. |
| 关 键 词： | 化学沉积 Fe-W-P合金 偶接铝 电化学法 |
Effect of Plating Bath Composition on the Deposition Behavior of Electroless Fe-W-P Ternary Alloy Costing |
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| ZHANG Jian-hui,HUANG Gui-fang,LIU Yu-ling,ZOU Ming-liang. Effect of Plating Bath Composition on the Deposition Behavior of Electroless Fe-W-P Ternary Alloy Costing[J]. Journal of Materials Protection, 2009, 42(2) | |
| Authors: | ZHANG Jian-hui HUANG Gui-fang LIU Yu-ling ZOU Ming-liang |
| Affiliation: | ZHANG Jian-hui1,2,HUANG Gui-fang1,LIU Yu-ling2,ZOU Ming-liang1,2(l.School of Physics , Microelectronics,Hunan University,Changsha 410082,China,2.Changsha Vocational Institute for Environmental Protection,Changsha410004,China) |
| Abstract: | Fe-W-P ternary alloy coating was prepared on brass substrate coupled with aluminum by electroiess deposition.The effect of the plating bath composition on the deposition behavior of Fe-W-P ternary alloy coating was inves-tigated using electrochemical method.The induction of coupled Al for the deposition of Fe-W-P was examined,while the deposition mechanism of the alloy coating was explored.Results showed that the deposition potential and current density varied with varying bath composition and plating param... |
| Keywords: | electroiess deposition Fe-W-P alloy coupled aluminum electrochemical method |
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