Fabrication of porous silicon by metal-assisted etching using highly ordered gold nanoparticle arrays

ABSTRACT: A simple method for the fabrication of porous silicon (Si) by metal-assisted etching was developed using gold nanoparticles as catalytic sites. Etching masks were prepared by spin-coating of colloidal gold nanoparticles onto Si. Appropriate functionalization of the gold nanoparticle surface prior to the deposition step enabled the formation of quasi-hexagonally ordered arrays by self-assembly which were translated into an array of pores by subsequent etching in a HF solution containing H2O2. The quality of the pattern transfer depended on the chosen preparation conditions for the gold nanoparticle etching mask. The influence of the Si surface properties were investigated by using either hydrophilic or hydrophobic Si substrates resulting from piranha solution or HF treatment, respectively. The polymer coated gold nanoparticles had to be thermally treated in order to provide direct contact at the metal/Si interface which is required for the following metal-assisted etching. Plasma-treatment as well as flame annealing were successfully applied. Best results were obtained for Si substrates which were treated with HF prior to spin-coating and flame annealed in order to remove the polymer matrix. The presented method opens up new resources for the fabrication of porous silicon by metal-assisted etching. Here, the vast variety of metal nanoparticles accessible by well-established wet-chemical synthesis can be employed for the fabrication of the etching masks.