| 静电驱动可调微机械电容 |
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| 引用本文： | 方东明,付世,周勇,赵小林. 静电驱动可调微机械电容[J]. 半导体学报, 2007, 28(9): 1454-1458 |
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| 作者姓名： | 方东明 付世 周勇 赵小林 |
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| 作者单位： | 微米/纳米加工技术国家级重点实验室,薄膜与微细技术教育部重点实验室,上海交通大学微纳科学技术研究院,上海,200030 |
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| 基金项目： | 国家高技术研究发展计划(863计划)，上海市应用材料研究与发展项目，非硅精密微机械制造技术研究基金，上海市纳米科技专项基金 |
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| 摘 要： | 利用简单MEMS技术制作了高品质因数的射频可调微机械电容.此电容由静电驱动,利用WYKO NT1100光学表面轮廓仪测量在不同外加直流电压下可变电容的表面轮廓和位移等信息.测试结果表明,电容的吸合电压为13.5V,电容可调比为1.31∶1,在1GHz下品质因数为51.6,电容值为0.79pF.
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| 关 键 词： | 可调电容 射频微机电系统 品质因数 |
| 收稿时间： | 2015-08-18 |
| 修稿时间： | 2007-04-16 |
A Tunable Micromechanical Capacitor Driven by Electrostatic Force |
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| Fang Dongming, Fu Shi, Zhou Yong, Zhao Xiaolin. A Tunable Micromechanical Capacitor Driven by Electrostatic Force[J]. Journal of Semiconductors, 2007, In Press. Fang D M, Fu S, Zhou Y, Zhao X L. A Tunable Micromechanical Capacitor Driven by Electrostatic Force[J]. Chin. J. Semicond., 2007, 28(9): 1454.Export: BibTex EndNote |
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| Authors: | Fang Dongming Fu Shi Zhou Yong Zhao Xiaolin |
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| Affiliation: | National Key Laboratory of Nano/Micro Fabrication Technology,Key Laboratory of the Ministry of Education for Thin Film and Microfabrication,Research Institute of Micro/Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;National Key Laboratory of Nano/Micro Fabrication Technology,Key Laboratory of the Ministry of Education for Thin Film and Microfabrication,Research Institute of Micro/Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;National Key Laboratory of Nano/Micro Fabrication Technology,Key Laboratory of the Ministry of Education for Thin Film and Microfabrication,Research Institute of Micro/Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;National Key Laboratory of Nano/Micro Fabrication Technology,Key Laboratory of the Ministry of Education for Thin Film and Microfabrication,Research Institute of Micro/Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China |
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| Abstract: | A radio frequency (RF) tunable micromechanical capacitor with a high quality factor driven by the electrostatic force was fabricated using simple MEMS technology.The surface profile and the displacement of the variable capacitor at different values of applied voltage are measured by using a WYKO NT1100 optical surface profiler.The measured results show that the pull-in voltage is 13.5V,the tuning ratio of the capacitor is 13.1∶1,and the quality factor and the capacitance are 51.6 and 0.79pF at 1GHz,respectively. |
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| Keywords: | tunable capacitor RF MEMS quality factor |
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