Crystallographic analysis of high quality poly-Si thin films deposited by atmospheric pressure chemical vapor deposition |
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Authors: | Y Ishikawa Y Yamamoto T Hatayama Y Uraoka T Fuyuki |
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Abstract: | Crystallinity of thin film polycrystalline silicon (poly-Si) grown by atmospheric pressure chemical vapor deposition has been investigated by X-ray diffraction measurement and Raman spectroscopy. Poly-Si films deposited at high temperatures of 850–1050°C preferred to 2 2 0 direction. By Raman spectroscopy, the broad peak of around 480–500 cm−1 belonged to microcrystalline Si (μc-Si) phase was observed even for the poly-Si deposited at 950°C. After high-temperature annealing (1050°C) 3 3 1 direction of poly-Si increased. This result indicates that the μc-Si phase at grain boundary became poly-Si phase preferred to 3 3 1 direction by high-temperature annealing. Effective diffusion length of poly-Si films deposited at 1000°C was estimated to be 11.9–13.5 μm and 10.2–12.9 μm before and after annealing, respectively. |
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Keywords: | Polycrystalline silicon Thin film solar cell Chemical vapor deposition Dichlorosilane Crystallinity |
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