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Use of optical absorption spectroscopy for the characterization of an Ar?Ti magnetron discharge
Authors:Nikolay Britun  Mireille Gaillard  Yong Mo Kim  Kab Seog Kim  Jeon-Geon Han
Affiliation:(1) Center for Advanced Plasma Surface Technology, Department of Advanced Materials Science and Engineering, Sung Kyun Kwan University, 300, Cheoncheon-dong, Jangan-gu, Suwon-si, 440-746 Gyeonggi, Korea;(2) Institute for Plasma and Advanced Materials, 288, Jipo-ri, Galmal-eup, Cheorwon-gun, 269-802 Gangwon, Korea
Abstract:The density of ground state and metastable Ti atoms were measured in a magnetron sputtering reactor with a 10 cm diameter Ti target by using resonant optical absorption spectroscopy. Experiments were conducted under various discharge parameters, namely the discharge current (0.2 A to 1.2 A) and the distance from the target (2 cm to 12 cm) under two working pressures (0.5 Pa and 4 Pa). The results were compared with previous results for a smaller magnetron source with a 5 cm diameter target. The Ti densities were as follows: Ti]≈1011 cm−3, Tim]=1010 to 1011 cm−3 for 0.5 Pa and Ti]≈Ti]=1010 to 1012 cm−3 for 4 Pa. The portion of Ti metastables in the discharge increases by a factor of approximately 2 as the working pressure increases.
Keywords:optical absorption spectroscopy  magnetron  plasma  titanium  metastable states
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