| 同步辐射光刻的X射线反射谱表征 |
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| 引用本文： | 杜晓松,Hak S,Hibma T,Rogojanu O C,Struth B. 同步辐射光刻的X射线反射谱表征[J]. 电子显微学报, 2006, 25(5): 368-372 |
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| 作者姓名： | 杜晓松 Hak S Hibma T Rogojanu O C Struth B |
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| 作者单位： | 电子科技大学 光电信息学院,四川,成都,610054;Material Science Centre, University of Groningen, Groningen 9747 AG, the Netherlands;European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France |
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| 基金项目： | 国家留学基金委留学基金;荷兰高等教育国际合作组织(Nuffic)资助项目 |
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| 摘 要： | 采用X射线反射（XRR）谱对同步辐射导致的氧化物薄膜的刻蚀进行了在位测试，结果表明波长为0．154nm的单色X光在室温下可对MgO和Cr2O3产生轻微的刻蚀。与文献中大量报道的同步辐射X射线光刻及烧蚀不同．这是单色X射线光刻的首次报道。尽管刻蚀速率极慢，但利用XRR谱的高分辨率，成功地检测到了膜厚的减薄。
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| 关 键 词： | 同步辐射 光刻 X射线反射谱 |
| 文章编号： | 1000-6281（2006）05-0368-05 |
| 收稿时间： | 2006-03-01 |
| 修稿时间： | 2006-03-012006-04-14 |
Synchrotron radiation induced surface etching characterized by X-ray reflectivity |
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| DU Xiao-song,Hak S,Hibma T,Rogojanu O C,Struth B. Synchrotron radiation induced surface etching characterized by X-ray reflectivity[J]. Journal of Chinese Electron Microscopy Society, 2006, 25(5): 368-372 |
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| Authors: | DU Xiao-song Hak S Hibma T Rogojanu O C Struth B |
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| Affiliation: | 1 School of Opto-electronic information, University of Electronic Science and Technology of China, Chengdu Sichuan 610054, China ; 2 Material Science Centre, University of Groningen, Groningen 9747 AG, the Netherlands; 3 European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France |
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| Abstract: | The synchrotron radiation(SR) etching of oxides were in situ measured by X-ray reflectance(XRR) spectra.The results showed that the monochromatic X-ray with a wavelength of 0.154nm could etch MgO and Cr_2O_3 thin films slightly.In contrast to the intense study of SR etching and ablation,this report was the first one concerning SR etching using a monochromatic light source.Although the etching rates were quite slow,the decreases of film thickness were successfully detected by XRR methods benefited by its high resolution for thickness determination. |
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| Keywords: | synchrotron photolithography X-ray reflectance spectra |
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