| 工业用巨型磁控溅射靶电源反馈控制的研究 |
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| 引用本文： | 尹金锒,王德苗,董树荣,张兴义.工业用巨型磁控溅射靶电源反馈控制的研究[J].真空,2006,43(1):30-32. |
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| 作者姓名： | 尹金锒 王德苗 董树荣 张兴义 |
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| 作者单位： | 浙江大学信息与电子工程学系,浙江,杭州,310027 |
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| 摘 要： | 磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。本文对于工业用巨型磁控溅射靶电流的不稳定因素进行了分析，设计并实现了靶电压的反馈控制系统，大大改善靶电压与反应气体流量之间的迟滞回线，增强了靶电压的可控制性，并在实际生产中得到成功应用。
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| 关 键 词： | 磁控溅射 反馈控制 靶电流 迟滞回线 |
| 文章编号： | 1002-0322（2006）01-0030-03 |
| 收稿时间： | 2005-06-18 |
| 修稿时间： | 2005-06-18 |
Power supply feedback control of industrial giant target during magnetic sputtering |
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| YIN Jin-lang,WANG De-miao,DONG Shu-rong,ZHANG Xing-yi.Power supply feedback control of industrial giant target during magnetic sputtering[J].Vacuum,2006,43(1):30-32. |
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| Authors: | YIN Jin-lang WANG De-miao DONG Shu-rong ZHANG Xing-yi |
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| Abstract: | Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target. Analyses the influencing factors on the current stability of a giant target in industrial application, then designs and implements a voltage feedback control system of the target to improve the smoothness of the hysteresis curve of target voltage versus reactive gas flowrate, thus upgrading the voltage controllability. The system has been applied successfully in industrial practice. |
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| Keywords: | magnetic sputtering current feedback control target hysteresis curve |
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