A study on the electrical and optical characteristics of IGZO films |
| |
Authors: | Tien-Chai Lin Wen-Chang Huang Wei-Che Lan |
| |
Affiliation: | 1. Department of Electrical Engineering, Kun Shan University, No. 195, Kun-Da Road, Yung-Kang District, Tainan, 71003, Taiwan, ROC 2. Department of Electro-Optical Engineering, Kun Shan University, No. 195, Kun-Da Road, Yung-Kang District, Tainan, 71003, Taiwan, ROC
|
| |
Abstract: | The electrical and optical properties of InGaZnO (IGZO) thin films were studied in the research. It was found that all the films deposited at room temperature exhibit amorphous structures. A better film quality was obtained at a lower pressure with sputtering ambiance. The RF power toward the IZO target was constant at 125 W; the RF power toward the Ga2O3 target varied from 0 to 70 W. A best IGZO film with corresponding resistivity, carrier concentration, and mobility is 7.94 × 10?4 Ω-cm, 1.68 × 1020 cm?3, and 47 cm2/V-s, respectively. Due to the doping of gallium in the IGZO film, it led to a lower resistivity than that of the IZO film. A blue shift effect of the film was also observed in the doping of gallium to the IGZO film. The H2 plasma effects toward the IGZO were also observed. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|