Improvement in optical and electrical properties of ZnO films by neodymium and aluminum co-doping |
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Authors: | L-L Wang Z-Q Ren Q Li |
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Affiliation: | 1. Key Laboratory of Auxiliary Chemistry and Technology for Chemical Industry, Ministry of Education, Shaanxi University of Science and Technology, Xi’an, 710021, Shaanxi, People’s Republic of China
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Abstract: | Neodymium and aluminum co-doping effect on optical and electrical properties of ZnO films with Al/Zn ratio of 0.01 were studied. The films were deposited by chemical solution deposition and characterized by X-ray diffraction, scanning electron microscopy, UV–Vis and luminescent spectrophotometry, and electrical measurement. The films showed nanoscale particle size increasing as increased Nd/Al ratio, and obvious variations in transmittance of the UV–Visible light range, band gap, and resistivity with changing of Nd/Al ratio. The optimal optical and electrical properties were achieved when Nd/Al ratio was 0.0039. The photoluminescence measurement indicated that the films showed strong near band gap emission and weak emissions related to intrinsic defect. |
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