| 分析薄膜厚度与成分的卢瑟福背散射技术 |
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| 引用本文： | 刘超卓. 分析薄膜厚度与成分的卢瑟福背散射技术[J]. 理化检验(物理分册), 2010, 0(7): 436-440 |
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| 作者姓名： | 刘超卓 |
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| 作者单位： | 中国石油大学（华东）物理科学与技术学院,东营257061 |
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| 基金项目： | 基金项目：中国石油大学（华东）自主创新科研计划项目（No.09CX04067A） |
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| 摘 要： | 对卢瑟福背散射分析技术的基本原理、试验设备、样品要求及数据处理方法进行了介绍,并举例分析了硅衬底上钛膜厚度的测定,以及钼衬底上钛钼合金膜的实际组分以及氦离子注入杂质的分布范围和实际剂量测定。讨论了卢瑟福背散射技术的发展和应用,介绍了弹性反冲、高能非卢瑟福散射和沟道技术三种分析方法。
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| 关 键 词： | 卢瑟福背散射 金属薄膜 厚度 合金成分 |
Rutherford Backscattering Technique for Analysing the Thickness and Composition of Thin Films |
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| LIU Chao-zhuo. Rutherford Backscattering Technique for Analysing the Thickness and Composition of Thin Films[J]. Physical Testing and Chemical Analysis Part A:Physical Testing, 2010, 0(7): 436-440 |
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| Authors: | LIU Chao-zhuo |
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| Affiliation: | LIU Chao-zhuo (School of Physics Science and Technology, University of Petroleum of China (East China), Dongying 257061, China) |
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| Abstract: | The essential principle of Rutherford backscattering （RBS） analysis and the experimental apparatus, samples requests and data processing were presented. For illustration with applications of RBS, several experiments were carried out. The thickness of titanium film on silicon substrate was obtained. The composition of titanium-molybdenum alloy film on molybdenum substrate was determined. And the information of implanted helium ions as the impurity, such as the distribution range and actual dose in the alloy film was also achieved. As the development and application of RBS, three analysis methods including the elastic recoil, high energy non-Rutherford scattering and channeling techniques were discussed. |
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| Keywords: | Rutherford backscattering metallic thin film thickness alloy composition |
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