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Substrate temperature-controlled precursor reaction mechanism of PEALD-deposited MoOx thin films |
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| Authors: | Wang Chen Bao Chun-Hui Wu Wan-Yu Hsu Chia-Hsun Zhao Ming-Jie Zhang Xiao-Ying Lien Shui-Yang Zhu Wen-Zhang |
| Affiliation: | 1.School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen, 361024, China ;2.Department of Materials Science and Engineering, Da-Yeh University, Dacun, Changhua, 51591, Taiwan ;3.Fujian Key Laboratory of Optoelectronic Technology and Devices, Xiamen University of Technology, Xiamen, 361024, China ; |
| Abstract: | Journal of Materials Science - Molybdenum oxide (MoOx) films had been grown by using plasma-enhanced atomic layer deposition (PEALD) with Mo(CO)6 precursor and O2 plasma reactant in a substrate... |
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