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An approach to the systematic distortion correction in aberration-corrected HAADF images
Authors:A M SANCHEZ†  P L GALINDO‡  S KRET§  M FALKE¶  R BEANLAND  & P J GOODHEW†
Affiliation:Departamento de Ciencia de los Materiales e I.M. y Q.I., and;Departamento de Lenguajes y Sistemas Informaticos, Universidad de Cadiz, Puerto Real, 11510, Spain; Department of Engineering, University of Liverpool, Liverpool L69 3GH, U.K.; Institute of Physics, Polish Academy of Science, Al. Lotnikow 32/46. PL-020668 Warzawa, Poland; UK SuperSTEM, Daresbury Laboratory, Daresbury WA4 4AD, U.K.; Bookham Technology, Caswell, Towcester, Northants. NN12 8EQ, U.K.
Abstract:Systematic distortion has been analysed in high‐angle annular dark‐field (HAADF) images which may be caused by electrical interference. Strain mapping techniques have been applied to a strain‐free GaAs substrate in order to provide a broad analysis of the influence of this distortion on the determination of local strain in the heterostructure. We have developed a methodology for estimating the systematic distortion, and we correct the original images by using an algorithm that removes this systematic distortion.
Keywords:Algorithm  distortion  HAADF  nanostructures  STEM
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