电子束蒸发沉积Ta2O5光学薄膜的研究

通过正交实验,以Ta2O5为初始膜料,采用离子源辅助电子束蒸发技术制备了Ta2O5光学薄膜。透射光谱显示,所制备的Ta2O5光学薄膜具有较高的透射率,极值点透射率约为93%,接近K9玻璃基片的透射率。极差分析表明,基片温度和离子源氧气流量是影响薄膜透射率的两个主要因素,而沉积速率的影响很小。分析了各制备参数对Ta2O5薄膜光学性能的影响,得到了采用离子源辅助电子束蒸发制备Ta2O5光学薄膜的最佳工艺参数。

Research on the Ta2O5 Optical Thin Films Deposited by Electron Beam Evaporation with Ion Assisted

The Ta2O5 optical thin films were deposited on K9 glasses with the Ta2O5 as coating materials by electron beam evaporation with ion beam assisted through orthogonal experiment.The transmittances of the as-deposited Ta2O5 thin films were excellent while the maximum transmittance was about 93%,close to the transmittance of K9 glasses.The substrate temperature and oxygen flux were the two key factors which influence the optical properties of the Ta2O5 thin films while the effect of deposition rate could be ignored according to the range analysis.The influences of preparation parameters on the optical properties of Ta2O5 thin films were analyzed and optimization fabrication parameters were obtained.