Comparison of electrical profiles from hot and cold implantations of zinc ions into GaAs |
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| Authors: | Kular SS Sealy BJ Stephens KG |
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| Affiliation: | University of Surrey, Department of Electronic & Electrical Engineering, Guildford, UK; |
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| Abstract: | Hole concentration and mobility profiles have been measured as a function of dose for 450 keV zinc ions implanted into GaAs. For doses above 1014 ions/cm2 implanted at 200°C very broad profiles were obtained suggesting that significant indiffusion has occurred. However, much narrower profiles were obtained after implanting at room temperature. Peak hole concentrations were in the range 1018?1019 holes/cm3. |
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