基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺研究

利用光学光刻技术进行多种形状规格聚二甲基硅氧烷(PDMS)微纳敏感结构的并行加工。研究了基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺,并加工出不同形状、、不同大小的PDMS微纳敏感结构。此外,对加工后的PDMS微纳敏感结构薄膜进行表征,观察了不同形状、不同大小的PDMS微纳敏感结构的形貌特征。结果表明:基于光学光刻技术的PDMS微纳敏感结构薄膜加工工艺具有加工效率高,加工过程中不需要刻蚀、激光加工等复杂工艺和昂贵设备的特点,并且实现了大批量PDMS微纳敏感结构的并行加工。同时,掩模板上的微纳图案较好地转移到PDMS薄膜上,具有较好的图案曝光成像和图形转移效果。此外,制备的PDMS微纳敏感结构形状较规则、排列整齐,并且不同形状,不同大小的PDMS微纳敏感结构都具有高度一致性较好,侧面轮廓分明,侧壁角接近90°的特征。

Formationof Micro/Nano-Structure on Polydimethylsiloxane Coating for Flexible Pressure Sensors:A Methodological Study

A novel technique was developed to directly form the micro/nano-structured polydimethylsiloxane(PDMS) coating,a state-of-the-art pressure-sensor material.A variety of the micro/nano-structures,fabricated by lithography on PDMS coatings deposited on Si-wafer,were characterized with scanning electron microscopy.The preliminary results show that the novel technique is capable of fabricating the well-defined micro/nano-patterns,including the circle,ellipse,square and rectangle pillar-arrays with uniform-height,good consistency,clear and steep(~90°) sidewall profile.When it comes to fabrication of different-sized PDMS micro/nano-patterns on industrial scale,the newly-developed technique outperforms the conventional method with Si-based mold because of lower production cost,higher efficiency,easier operation and better environmental friendliness,and because of no investment for complicated equipment in chemical etching and laser machining of Si-based mold.