| 磁控溅射工艺控制模式比较 |
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| 引用本文： | 郑舒颖,陈少扬. 磁控溅射工艺控制模式比较[J]. 光学仪器, 2001, 0(Z1) |
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| 作者姓名： | 郑舒颖 陈少扬 |
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| 作者单位： | 中南实业国际(深圳)有限公司 MT8广东深圳518129(郑舒颖)，中南实业国际(深圳)有限公司 MT8广东深圳518129(陈少扬) |
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| 摘 要： | 对各种磁控溅射的工艺参数控制技术进行比较 ,分析各自的特色 ,并指出光学厚度监控对于制备精密光学多层膜的反应溅射工艺的重要性
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| 关 键 词： | 反应磁控溅射 溅射工艺控制 电介质薄膜 |
Evaluation of various process control modes in reactive magnetron sputtering |
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| ZHENG Shu ying,CHEN Shao Yang. Evaluation of various process control modes in reactive magnetron sputtering[J]. Optical Instruments, 2001, 0(Z1) |
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| Authors: | ZHENG Shu ying CHEN Shao Yang |
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| Abstract: | Various process control modes in reactive magnetron sputtering were evaluated. As indicated in this paper, optical thickness monitoring was much more important in the precision optical multilayer production by reactive sputtering processes. |
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| Keywords: | reactive magnetron sputtering sputtering process control dielectric thin films |
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