声表面波MEMS器件的设计和制作工艺 |
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引用本文: | 高爱华,鲍帅,刘欢. 声表面波MEMS器件的设计和制作工艺[J]. 西安工业大学学报, 2012, 0(10): 785-788,810 |
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作者姓名: | 高爱华 鲍帅 刘欢 |
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作者单位: | 西安工业大学光电微系统研究所,西安710032 |
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摘 要: | 为了探索声表面波器件制作工艺,在压电器件工作原理的基础上,通过设计声表面波器件的工作频率、叉指宽度、间隙及对数等器件参数,绘制了掩模板,对制作的声表面波器件进行测试,制作了不同叉指对数、孔径长度、中心距离的电极.实验结果表明:以石英为基底,使用EPG533型光刻胶在前烘温度为105℃,曝光时间为8S,显影时间为50S时获得了较理想电极图形和稳定的实验参数.
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关 键 词: | 声表面波 微机电系统技术 器件制作 器件测试 |
Surface Acoustic Wave MEMS Device Design and Fabrication Process |
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Affiliation: | GAO Ai-h ua, BAO Sh uai , L IU Huan ( Micro-optoelectronic System Labs, Xi ' an Technological University, Xi ' an 710032, China) |
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Abstract: | In order to explore a set of appropriate production technology of SAW devices, based on the basic working principle of piezoelectric devices, the process parameters including the operating frequency of the device, the width of inter digital transducer, the logarithmic of inter digital transducer and so on were designed and the mask was drawn. Then the SAW devices with the electrode of different inter digital logarithm, the length of the aperture and the center distance were made and tested. The desired electrode patterns were obtained with the prebake temperature of 105℃, the exposure time of 8 seconds and the development time of 50 seconds using a quartz piezoelectric substrate EPG533 photoresist. The stability and repeatability of experimental parameters are satisfactory. |
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Keywords: | surface acoustic wave micro-electromechanical system technology fabrication testing |
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