| 脉冲多弧离子镀沉积类金刚石薄膜的牢固度研究 |
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| 引用本文： | 喻志农,朱昌,杭凌侠,刘卫国,严一心. 脉冲多弧离子镀沉积类金刚石薄膜的牢固度研究[J]. 西安工业学院学报, 1999, 19(3): 177-181 |
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| 作者姓名： | 喻志农 朱昌 杭凌侠 刘卫国 严一心 |
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| 作者单位： | 西安交通大学电子物理与器件研究所!陕西西安710049(喻志农)，西安工业学院仪器工程系(朱昌，杭凌侠，刘卫国，严一心) |
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| 摘 要： | 利用脉冲多弧离子镀技术在硅基片上沉积类金刚石薄膜．分析了类金刚石薄膜的牢固度与各种工艺条件的关系．实验结果表明：基片的清洗、基片温度、主回路电压、脉冲频率、烘烤处理都强烈影响类金刚石薄膜的牢固度．同时从理论上分析了利用离子束辅助蒸发工艺可以进一步提高类金刚石薄膜的牢固度
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| 关 键 词： | 脉冲多弧离子镀 类金刚石薄膜 牢固度 工艺条件 |
| 文章编号： | 1000-5714(1999)03-0177-05 |
| 修稿时间： | 1999-04-05 |
Adhesion of diamond-like carbon films prepared by pulse-arc plasma deposition |
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| YU Zhi-nong,ZHU Chang,HANG Ling-xia,LIU Wei-guo,YAN Yi-xin. Adhesion of diamond-like carbon films prepared by pulse-arc plasma deposition[J]. Journal of Xi'an Institute of Technology, 1999, 19(3): 177-181 |
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| Authors: | YU Zhi-nong ZHU Chang HANG Ling-xia LIU Wei-guo YAN Yi-xin |
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| Abstract: | Diamond like carbon films are prepared on silicon by pulse arc plasma deposition. The relationships between adhesion of the deposited films and deposition parameters have been systematically analysed. The results show that methods to clean substrate, substrate temperature, voltage U across the interelectrode, frequency of pulse and annealing greatly effect adhesion of the deposited films. It is theoretically proved that ion beam assistant deposition helps strengthen adhesion of the deposited films. |
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| Keywords: | pulse arc plasma diamond like carbon film adhesion deposition parameters |
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