Measurement of the physical thickness and refractive index of thin epitaxial garnet films |
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Authors: | R.D. Henry J. SooHoo |
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Affiliation: | Rockwell International, Electronics Research Center 3370 Miraloma Avenue, Anaheim, California 92803 USA |
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Abstract: | A technique for the measurement of refractive index and physical film thickness of epitaxial garnet films is described which utilizes variable wavelength measurements. Experimental results are presented for gadolinium gallium garnet substrates and two different bubble domain film compositions. From these results, it is concluded that the technique is not applicable to wafers with films on both sides due to the differences in film thickness of the two films. For single sided wafers, the refractive index can be determined with an accuracy of ±0.3 percent. |
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