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氧化铝复合磨粒的抛光特性研究
引用本文:雷红,卢海参,严琼林,褚风灵,丘海能. 氧化铝复合磨粒的抛光特性研究[J]. 润滑与密封, 2007, 32(11): 82-85
作者姓名:雷红  卢海参  严琼林  褚风灵  丘海能
作者单位:上海大学纳米中心,上海,200444;深圳开发磁记录股份有限公司,广东深圳,518035
基金项目:国家自然科学基金;国家重点基础研究发展计划(973计划)
摘    要:为提高氧化铝磨料分散稳定性,利用接枝聚合对氧化铝粒子进行了表面改性,并研究了改性后氧化铝粒子在数字光盘玻璃基片中的化学机械抛光特性。结果表明,氧化铝复合磨粒的抛光性能与其表面接枝率密切相关。接枝率上升,材料去除速率下降;试验条件下,当接枝率为2.93%时,氧化铝磨粒体现出较高的表面平整性、较低的表面粗糙度及较低的表面损伤。

关 键 词:化学机械抛光(CMP)  氧化铝复合磨粒  玻璃基片
文章编号:0254-0150(2007)11-082-4
修稿时间:2007-06-05

Study on Polishing Properties of Alumina Composite Abrasive
Lei Hong,Lu Haishen,Yan Qionglin,Chu Fengling,Qiu Haineng. Study on Polishing Properties of Alumina Composite Abrasive[J]. Lubrication Engineering, 2007, 32(11): 82-85
Authors:Lei Hong  Lu Haishen  Yan Qionglin  Chu Fengling  Qiu Haineng
Affiliation:1. Research Center of Nano-science and Nano-technology,Shanghai University,Shanghai 200444, China; 2. Shenzhen Kaifa Magnetic Recording Co. , Ltd,Shenzhen Guangdong 518035, China
Abstract:In order to enhance the dispersion stability of alumina abrasive and prevent agglomeration in chemical mechanical polishing(CMP),the surface modification of alumina particles with grafting polymerization was conducted.SEM indicates that alumina particles with grafting modification have better dispersion stability than that unmodified.The polishing performances of the prepared alumina composite abrasive on digital compact disc(CD) glass substrate were investigated.The results that the polishing performances of the alumina composite abrasive are much dependent on the grafting ratio.With the increasing of grafting ratio,the material removal rate decreases gradually.By comparison with pure alumina abrasive,the alumina composite abrasive with 2.93% grafting ratio exhibites higher surface planarization,lower surface roughness and less surface scratches.
Keywords:chemical mechanical polishing(CMP)  alumina composite particle  glass substrate
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