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Interfacial Interactions Between WxN Substrates and a Gold-Tin Alloy
Authors:P.?Descours,R.?Voytovych,A.?Garnier,F.?Greco,F.?Hodaj  author-information"  >  author-information__contact u-icon-before"  >  mailto:fiqiri.hodaj@simap.grenoble-inp.fr"   title="  fiqiri.hodaj@simap.grenoble-inp.fr"   itemprop="  email"   data-track="  click"   data-track-action="  Email author"   data-track-label="  "  >Email author
Affiliation:1.CEA-Léti-MINATEC Campus,Grenoble,France;2.SIMaP-UMR CNRS 5266, Grenoble INP-UJF,Saint Martin d’Hères,France
Abstract:Au-Sn is an excellent material with superior attributes and is the solder of choice, with no obvious alternatives, in many microelectronic applications. Recently, this alloy has been chosen as a potential candidate for bonding in wafer level hermetic packaging at high temperature using WN as diffusion barrier. In this application, good wetting of WN by the liquid Au-Sn alloy is a key factor for the bonding process. To this end, wetting of W x N (covered or not by a gold layer) by Au-Sn20 alloy was studied at 380 °C under high vacuum. Excellent wetting was observed when W x N was protected from oxidation by a thin Au layer. The spreading process was found to be followed by a complete dissolution of a protection layer and slight receding of the triple line. Some preliminary bonding tests using Au-Sn alloy were also performed.
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