首页 | 本学科首页   官方微博 | 高级检索  
     


Displacement mechanism of binary competitive adsorption for aqueous divalent metal ions onto a novel IDA-chelating resin: isotherm and kinetic modeling
Authors:Li Lanjuan  Liu Fuqiang  Jing Xiaosheng  Ling Panpan  Li Aimin
Affiliation:a State Key Laboratory of Pollution Control and Resource Reuse, School of the Environment, Nanjing University, Nanjing 210046, PR China
b State Environmental Protection Engineering Center for Organic Chemical Industrial Waste Water Disposal Resource Reuse, Nanjing 210046, PR China
c Shaanxi Institute of Environmental Science, Xi'an 710054, PR China
Abstract:Adsorptive properties for Cu (II), Pb (II) and Cd (II) onto an iminodiacetic acid (IDA) chelating resin were systematically investigated at the optimal pH-value in both single and binary solutions using batch experiments. The Langmuir isotherm model and the pseudo second-order rate equation could explain respectively the isotherm and kinetic experimental data for sole-component system with much satisfaction. The maximum adsorption capacity in single system for Cu (II), Pb (II) and Cd (II) was calculated to be 2.27 mmol/g, 1.27 mmol/g and 0.65 mmol/g individually. The initial adsorption rate followed the order as Cu (II) > Pb (II) > Cd (II) at the fixed initial concentration, and for each metal the initial sorption rate increased as the initial concentration increased. In addition, the modified Langmuir model could describe the binary competitive adsorption behavior successfully, with which the interaction coefficient was obtained to follow the order as Cu (II) < Pb (II) < Cd (II). Furthermore, in every case of the investigated three binary systems, the reduction in both the uptake amounts and distribution coefficients testified the antagonistic competitive phenomena. Obviously, this novel IDA-chelating resin possessed of a good selectivity toward Cu (II) over Pb (II) and Cd (II) for the obtained highest separation factor values were up to 21.30 and 133.91 in the range of tested. This interaction mechanism between the favorable component and other metal ions could mainly contribute to the direct displacement impact which be herewith illustrated schematically.
Keywords:Iminodiacetic acid chelating resin  Metal ion  Competitive adsorption  Displacement mechanism  Selectivity
本文献已被 ScienceDirect PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号