Reactive ion etching for the production of metal microstructures by hot embossing |
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| Authors: | O. Roetting M. Heckele W. Bacher |
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| Affiliation: | (1) Forschungszentrum Karlsruhe, Institute for Microstructure Technology, PO Box 3640, D-76021 Karlsuhe, Germany, DE |
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| Abstract: | A reactive ion etching process which has been developed in order to remove the residual polymer layer, that remains at the bottom of microstructures made by hot embossing, is described. The influence of parameters and structures is explained. Received: 4 December 1998/Accepted: 20 January 1999 |
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